JPS5638686B2 - - Google Patents
Info
- Publication number
- JPS5638686B2 JPS5638686B2 JP13421573A JP13421573A JPS5638686B2 JP S5638686 B2 JPS5638686 B2 JP S5638686B2 JP 13421573 A JP13421573 A JP 13421573A JP 13421573 A JP13421573 A JP 13421573A JP S5638686 B2 JPS5638686 B2 JP S5638686B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Artificial Filaments (AREA)
- Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13421573A JPS5638686B2 (en]) | 1973-11-28 | 1973-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13421573A JPS5638686B2 (en]) | 1973-11-28 | 1973-11-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5083528A JPS5083528A (en]) | 1975-07-05 |
| JPS5638686B2 true JPS5638686B2 (en]) | 1981-09-08 |
Family
ID=15123107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13421573A Expired JPS5638686B2 (en]) | 1973-11-28 | 1973-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5638686B2 (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0211931U (en]) * | 1988-07-04 | 1990-01-25 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6248882B2 (ja) | 2014-09-25 | 2017-12-20 | 信越化学工業株式会社 | スルホニウム塩、レジスト組成物及びレジストパターン形成方法 |
| JP6515831B2 (ja) | 2015-02-25 | 2019-05-22 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト組成物及びレジストパターン形成方法 |
| JP6298022B2 (ja) | 2015-08-05 | 2018-03-20 | 信越化学工業株式会社 | 高分子化合物、ポジ型レジスト組成物、積層体、及びレジストパターン形成方法 |
| US10416558B2 (en) | 2016-08-05 | 2019-09-17 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition, resist pattern forming process, and photomask blank |
| JP7009978B2 (ja) | 2016-12-28 | 2022-01-26 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト組成物及びレジストパターン形成方法 |
-
1973
- 1973-11-28 JP JP13421573A patent/JPS5638686B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0211931U (en]) * | 1988-07-04 | 1990-01-25 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5083528A (en]) | 1975-07-05 |